Solvent Retention in Thin Spin-Coated Polystyrene and Poly(methyl methacrylate) Homopolymer Films Studied By Neutron Reflectometry
نویسندگان
چکیده
Weutilize neutron reflectometry (NR) to probe the amount of residual solvent in thinpolystyrene (PS) and poly(methyl methacrylate) (PMMA) films spin-coated from deuterated toluene solutions onto silicon substrates.The effect of thermal treatment at temperatures belowandabove the glass transitionofPSandPMMA are examined to determine how these treatments affect the residual solvent. The parameters investigated include the total film thickness and molecular mass for PS and only thickness for PMMA. We find that the volume fractionof solvent inPMMAfilms is less thana fewpercentages,while no residual solventwasdetected inPS films. The residual solvent content of the PMMA films had a slight dependence on thickness. These results are corroborated utilizing Fourier Transform infrared (FTIR) spectroscopy. We discuss these observations in the context of a large body of seemingly conflicting literature on residual solvent in polymer thin films.
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